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|The Bridge Crystallography Times|
October 17, 2017, Rochester, NY. — Rigaku Innovative Technologies (RIT), a leading global supplier of multilayer optics and coatings for EUV lithography (EUVL), elemental and material analysis, atomic structure of a crystal or macromolecule and imaging optics, is pleased to announce its attendance at the 2017 SPIE Optifab Exhibition in Rochester, New York.
September 12, 2017, Monterey, CA. — Rigaku Innovative Technologies (RIT), a leading global supplier of multilayer optics for EUV lithography (EUVL), is pleased to announce its attendance at the SPIE Photomask Technology + Extreme Ultraviolet Lithography 2017 meeting in Monterey, California.
An X-ray telescope featuring multi-foil optics from Rigaku Innovative Technologies Europe s.r.o. (RITE) was successfully launched into orbit and is capable of testing technologies for monitoring a wide range of astrophysical and terrestrial phenomena.
The current edition of Photonics Spectra magazine features a Product Release from Rigaku Innovative Technologies Inc. on EUVL Optical Coatings
May 22, 2017 – Auburn Hills, Michigan. Rigaku Innovative Technologies (RIT) has published a new product release describing precision extreme UV lithography (EUVL) optical coatings. The article appears in the May 2017 edition of Photonics Spectra, and was selected by the publication.
February 6, 2014 – Auburn Hills, MI — Rigaku Innovative Technologies (RIT), a leading global supplier of multilayer optics for EUV lithography (EUVL), will showcase their new MaxEuv™ technology at the 2014 SPIE Advanced Lithography Conference and Exhibition in San Jose, California February 23rd - 27th.
July 11, 2013 – Rigaku Innovative Technologies today announced that it will host one student from Brazil as an intern this summer, as part of a prestigious scholarship program sponsored by the government of Brazil. The students will gain valuable experience in optics manufacturing and contribute their international perspective and experience to the company.
Auburn Hills, MI — November 1, 2010. Rigaku Innovative Technologies (RIT) today celebrated its 25th anniversary of leadership in X-ray optics by announcing further expansion into the optics market for extreme ultraviolet lithography (EUVL).