EUV

EUV/XUV Multilayers and Coatings


Rigaku Innovative Technologies (RIT), formerly Osmic, is a supplier of the full range of Extreme Ultraviolet (EUV) multilayers and coatings for optics with over 20 years’ experience, and participates in the global research and infrastructure-development of the commercial EUVL (EUV Lithography) implementation to support the continued scaling of computer chip circuitry.

In the last five years, over $9M has been invested in major expansions for EUV research and development, deposition equipment and facility upgrades. RIT has proven expertise & capability to address any application or design requirement, with customized multilayer designs to meet the unique requirements of the optical system. RIT is a global provider of EUV Collectors, Illumination and Imaging optics with demonstrated world-class results in nearly every class of EUV optics.

Examples of EUV Optics from left to right: Asphere Optic, Parabolic Optic, Illuminator Optic, Collector Optic and Schwarzchild Optic

EUV & XUV refers to Extreme Ultraviolet radiation: wavelengths of 2-200nm, or equivalently energy of 6-600 eV. EUVL multilayers are specific to the lithography processing for computer chip ULSI circuitry is 13.5nm, or 91.8ev

Capabilities


Applications
EUVL-13.5nm, 6.7nm
Astronomy
Analyzers

Optics
Spheres & Aspheres
Elliptical & Parabolic
Flats
Toroidal
Cylindrical
Hyperbolic
1 & 2D Gradients
Systems
Imaging Systems
Illumination Systems
Collectors & Condensors
Monochromators
Mask Blanks
Polarizers

Coating Designs
Uniform
Radial
2D Laterally Graded
Depth Graded


Various off-axis coatings


Uniform coating

History of EUV & EUVL at Rigaku


With 20+ years experience in multilayer coatings for EUV optics, Rigaku demonstrates success in every facet of EUV multilayers, coatings and designs. Rigaku, formerly Osmic Inc., was at the forefront of the history of EUVL development, developing the multilayers for some of the very first imaging optics and mask blanks, and has continued with world-class contributions ever since.

The timeline below shows Rigaku’s history of EUV contributions, highlighting the various optics and various multi-optic systems.

Success Stories


Example 1: Illumination System
In 2013, Rigaku completed a 5-optic illumination system, later linked to the 2016 delivery of a >400mm diameter collector. In addition to providing all multilayers, Rigaku was instrumental in the optical design analysis using such tools as Zemax, to optimize the optical scheme, optic shapes and multilayer designs.

The collector optic was a focusing ellipsoid of revolution, and had a surface grating that would reject unwanted infra-red (IR) radiation with minimal impact to the reflection of 13.5nm EUV source. *Example 1, courtesy of “The Recent Study of Resist Outgassing in the Hydrogen Environment,” Eishi Shiobara et. al., 2016 International Symposium on Extreme Ultraviolet Lithography, International Sematech, Hiroshima, Japan, 2016.

The collector delivered the EUV light to a trio of paraboloid-shaped optics which created two separate beams of designed illumination, redirected via a pair of EUV 45° incidence flats.

Example 2: Illumination + Imaging System
In 2012, Rigaku completed a multi-optic system for high-precision imaging. The first two optics were precision ellipsoid surfaces, with Rigaku-designed kinematic mounting systems, that delivered light into a Schwarzschild imaging system, a pair of aspherical optics. These illumination optics required complex 2-dimensional multilayer gradients to efficiently deliver EUV photons.

The imaging optics were deposited ultra-precisely with radial symmetry to minimize distortions to the near-perfect surface of the optics. Multilayer contributions to figure error were below 200 picometers. *Example 2, courtesty of “Defect Review Capability Enhancement for Actinic Blank Inspection Tool,” Kiwamu Takehisa et. al., 2016 International Symposium on Extreme Ultraviolet Lithography, International Sematech, Hiroshima, Japan, 2016.

Example 3: Illumination + Imaging System
In 2005, Rigaku completed a multi-optic Reticle Imaging System, that was composed of four illumination optics (C1-C4) and a pair of imaging optics (M1-M2). Precise and complex multilayer gradients were required to ensure uniform illumination, as well as ultra-low added distortions to the imaging field. *Example 3, image courtesy of private communications, reference material of 2006 EUVL Symposium, Proc. SPIE 6151, Emerging Lithographic Technologies X, (March 24, 2006)

MoSi Performance Benchmarks


In order for EUV multilayers to be of practical use, they must have ultra-low roughness on the nanometer scale, measurable only with the use of an atomic force microscope (AFM). A typical Molybdenum-Silicon (MoSi) multilayer will contain 80 individual thin layers of 2.5 nm – 4 nm thickness, where the roughness of each interface must be less than 0.2 nm. Putting this in perspective, the radius of an individual Mo atom is 0.14 nm!

Rigaku repeatedly demonstrates capability to produce world-class EUV multilayer performance. Some of our achievements and benchmarks are shown below.

Champion MoSi Multilayer

With the use of optimized interfacial-stabilization layers, the champion performance for Rigaku with MoSi is 69.2% peak reflectivity for normal incidence. Compared to Rigaku’s routine performance of 66.5% for 40-layer ML and 67.5% for 60-period ML, this champion performance would produce up to +60% more total power in a 12-optic lithography system.

High-Temperature Mo/X/Si Multilayers

With the use of interface-stabilization layers optimized for temperature stability, Rigaku produces EUV multilayers with excellent temperature stability, capable of retaining high reflectivity and minimal peak shift when subjected to vacuum annealing at high temperatures.

EUV High-Selectivity Multilayers

In addition to standard MoSi multilayers with ~4% bandpass, Rigaku developed multilayers for specialized applications requiring high-selectivity. The multilayer below narrows the bandpass to 1.1% using SiC and Si layers.

Rigaku Facilities


Rigaku’s Auburn Hills manufacturing and design facilities are tailored to the production of EUV optics. Over $9M has been invested in major expansions for EUV research and development, deposition equipment and facility upgrades, including:

Deposition
  • 2 state-of-the-art ultra-high vacuum inline systems
  • 8 total sputter-deposition systems located in 2 separate cleanrooms
  • Optics up to 1.5 meter in length or 0.75 meter diameter
  • Up to 9 target materials in a single deposition
  • Ion-milling capability for substrate decontamination
Metrology
  • Custom purpose-built x-ray reflectivity for probing multilayer structure
  • Strategic partnerships with the major synchrotron-based EUV metrology centers (CXRO, NIST, PTB, New Subaru)
  • Veeco/Dimension atomic force microscope (AFM) for surface topology and roughness
  • Zygo NewView interferometric microscope
  • Custom purpose-built curvature & figure measurement
  • Future-fab cleaning bench & support systems
Design & Manufacturing
  • Optical ray-tracing design & analysis
  • Team of mechanical designers
  • In-house machine shop

Refurbishment of Multilayer EUV Optics based on Mo/Si Coating


Wet etching: Mo/Si ML on Si substrate
EUV mirrors consisting of multilayer structures deposited on silicon substrates were etched clean then another Mo/Si multilayer structure was deposited. Then the refurbishment process was repeated 5 times. The observed roughness increase was from ~0.19nm to 0.26nm and the EUV reflectivity loss was measured to be 1.2%.


EUV Reflectivity after 5 refurbishment cycles

Reactive Ion Etching
Cu-Ka reflectivity curves from EUV mirror before and after RIE. Absence of reflectivity peaks and the critical angle position demonstrate a successful removal of a multilayer structure from a silicon substrate. EUV reflectivity of a re-coated multilayer structure is currently under testing.


Angular reflectivity of Cu-Ka (λ=0.154nm) radiation from EUV mirror before and after RIE.

Total Reflection and Multi Foil Optics (MFO) for Hard and Soft X-rays


In 2008, Rigaku Innovative Technologies Europe s.r.o. (RITE) became part of the Rigaku Corporation. RITE's primary focus has been research & development projects which have resulted in an extension of Rigaku's X-ray optics and detectors for EUV/XUV, Hard and Soft X-rays.

RITE manufactures and sells Total Reflection X-ray Optics. Total Reflection X-ray Optics are specially designed to satisfy both the evolving EUV/XUV industry and the more established Hard and Soft X-ray applications.

RITE has mastered a unique manufacturing technology called replication. This manufacturing technique enables the production of X-ray optics with unique optical features such as low weight, high surface precision (low slope error) and extremely low micro-roughness. Another interesting attribute of Total Reflection Optics is the use of various metallic layers as coatings. The most commonly used materials are Ni, Au, Mo and Ru.

Extending the replicated optics technologies, RITE designs and produces Multi Foil Optics (MFO). These specialty optics are perfectly suited for applications where low energies and a very wide field of view is needed.

Contact Us


Rigaku Innovative Technologies, Inc.
1900 Taylor Road
Auburn Hills, MI 48326
Phone: 248-232-6400
Email: optics@rigaku.com
The Americas and Asia
Nick Grupido
Vice President, Sales and Marketing
Phone: 248-232-6400
Europe and Australia
Paul Pennartz
European Channel Manager
Indestr. 109
52249 Eschweiler, Germany
Phone: +49 (0) 172 9347 323
Japan – Sales Distributor
Yuko Kyozawa
RAD Device Co., Ltd.
URBANPLAZA IZUMI 7F 2-26-4 Myojin-Cho
Hachioji-Shi, Tokyo 〒192-0046, JAPAN
Phone: +81-42-642-0889
Fax : +81-42-642-0896